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Technology & Innovation

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Effects of the cap layer on the properties of ALN barrier HEMT grown on 6-inch Si(111) substrate

Yuanyang Xia,Youhua Zhu,Chunhua Liu,Hongyuan Wei,Tingting Zhang,YeehengLee,TinggangZhu,Meiyu wang,Li Yi and MeiGe

IOP Publishing Mater.Res.Express 7(2020)065902

https://doi.org/10.1088/2053-1591/ab96f5

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